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Awarded European Union SuppliesEU-funded

High-vacuum chamber for thin-film synthesis

Buyer: Helsingin yliopisto

Published
23 October 2025
Place of performance
FI1B1
Procedure
Open procedure
Lots
1
Notice number
00698922-2025
Reference
35daa845-e00e-4bea-9542-ba7c0e5dd074
Official source
Official source

CPV codes

Description

The procurement procedure was suspended due to a technical error. A new call for tenders has been published. --------------------------- The Helsinki Accelerator Laboratory (HAL) at the Department of Physics of the University of Helsinki (UH) is going to acquire a multi-source high vacuum (HV) chamber for thin-film deposition using magnetron sputtering. The magnetron sources will be capable of operating in direct-current magnetron sputtering (DCMS), radio-frequency magnetron sputtering (RFMS), and high-power impulse magnetron sputtering (HiPIMS) modes. Key feature of the deposition chamber will be the ability to accommodate and deposited homogeneously on substrates with diameter up to 8 inches (203.2 mm). A quick access port for loading and unloading substrates with a diameter up to 8 inches (203.2 nm) to the deposition chamber will be available. Moreover, the chamber design will allow provisionally for future functional expansion including installing a thermal evaporator for thin film deposition and a load-lock chamber for transferring samples to the deposition chamber without vacuum cycle interruption. RFMS and HiPIM power supplies, as well as instrumentation for thin film therma…

Award criteria

Official publications

Other tenders from Helsingin yliopisto

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Data collected from official public procurement sources. Amounts as published by the buyer.