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High-vacuum chamber for thin-film synthesis

Buyer: Helsingin yliopisto

Published
22 October 2025
Submission deadline
19 November 2025, 10:00
Place of performance
FI1B1
Procedure
Open procedure
Lots
1
Documents
1
Notice number
00697042-2025
Reference
35daa845-e00e-4bea-9542-ba7c0e5dd074
Official source
Official source

CPV codes

Description

The Helsinki Accelerator Laboratory (HAL) at the Department of Physics of the University of Helsinki (UH) is going to acquire a multi-source high vacuum (HV) chamber for thin-film deposition using magnetron sputtering. The magnetron sources will be capable of operating in direct-current magnetron sputtering (DCMS), radio-frequency magnetron sputtering (RFMS), and high-power impulse magnetron sputtering (HiPIMS) modes. Key feature of the deposition chamber will be the ability to accommodate and deposited homogeneously on substrates with diameter up to 8 inches (203.2 mm). A quick access port for loading and unloading substrates with a diameter up to 8 inches (203.2 nm) to the deposition chamber will be available. Moreover, the chamber design will allow provisionally for future functional expansion including installing a thermal evaporator for thin film deposition and a load-lock chamber for transferring samples to the deposition chamber without vacuum cycle interruption. RFMS and HiPIM power supplies, as well as instrumentation for thin film thermal evaporation, and load-lock chamber are not part of this tender. HAL is a leading materials science environment in Finland. The current…

Award criteria

Official publications

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Frequently asked questions

What is the deadline to bid for this tender?
The submission deadline is 19 November 2025, 10:00. Check the official source, as dates can be modified.
Who is the buyer of this tender?
The contracting authority is Helsingin yliopisto (European Union).
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Data collected from official public procurement sources. Amounts as published by the buyer.