Plasma enhanced chemical vapour deposition tool
Buyer: TEKNOLOGIAN TUTKIMUSKESKUS VTT OY
- Published
- 7 September 2026
- Procedure
- Negotiated procedure
- Lots
- 1
- Notice number
- 00615316-2026
- Reference
- 947d4fa6-81c9-416b-a79f-c15271acd94f
- Official source
- Official source
CPV codes
- 38000000Equipo de laboratorio, óptico y de precisión (excepto gafas)
Description
THE SUBJECT OF THE PROCUREMENT The subject of the procurement is a plasma-enhanced automated cassette to cassette chemical vapor deposition (PECVD) system for deposition of dielectric thin films (SiO#, SiN, TEOS, SiON, a Si) for research and pilot line use in the VTT Micronova cleanroom. DIRECT AWARD, Article 40 2(2) of Finnish Procurement act (1397/2016) The procurement will be carried out as a direct award in accordance with 40 article Section 2(2) of the Finnish Public Procurement Act. According to the 40 § section 2(2) of the Act on Public Contracts (1397/2016), only a certain supplier can implement the procurement for a technical reason, or for a reason related to protecting an exclusive right; it shall be a further condition that there are no reasonable alternatives or substitute solutions, and that the absence of competition is not due to an artificial narrowing of the terms and conditions of the procurement. The justification for direct procurement applies in this case, as VTT already operates an existing deep reactive ion etching (DRIE) system manufactured by SPTS. In order to extend the operational lifetime of the existing etch chamber, and optimize the use of limite…
Award criteria
- Price — Reference price
Awards
| Awarded to | Amount | Date |
|---|---|---|
| KLA Corporation | — | — |
Official publications
- TED · 00615316-2026 · 7 September 2026
- OJS · 172/2026 · 7 September 2026
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