Atomic Layer Etching for 2DM studies - AWARD
Reference ocds-b5fd17-75837845-e2ba-4b10-b3e9-9278d3f376c3 · The University of Manchester
Awarded to SENTECH Instruments GmbH.
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Description
Background information on Project This tender is being run on behalf of Prof. Roman Gorbachev for the School of Physics and Astronomy/National Graphene Institute. Project Overview The National Graphene Institute (NGI) has a large cleanroom facility housing a range of state-of-the-art instruments dedicated to the fabrication and characterization of 2D related metamaterials and devices for a broad range of applications, from advanced optoelectronics to nanofluidics. An essential part of many fabrication processes is the capability to dry etch materials. A range of plasma-based dry etching techniques have been developed for 2D materials (2DM), primarily to completely remove specific regions in order to create a pattern defined by a lithographic mask. "Thinning down" of atomically thin 2DM by etching so far remains problematic, as the surface amorphization leads to complete loss of their unique properties. Subsequently, "soft-plasma" etching techniques were developed to approach layer-by-layer etching of various 2DM. These methods provide great control of the thickness, but they are not self-limiting in nature due to associated physical etching processes an…
Awards
| Awarded to | Amount | Date |
|---|---|---|
| SENTECH Instruments GmbH | £0 | 8 October 2024 |
Official publications
| Medium | Reference | Date |
|---|---|---|
| FTS | 065154db-e623-4ebc-9714-a3ecd9ea6b5c-791975 | 8 October 2024 |
| Contracts Finder | 065154db-e623-4ebc-9714-a3ecd9ea6b5c-791975 | 8 October 2024 |
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