Deep Reaction Ion Etcher (DRIE)
Buyer: Uppsala universitet
- Published
- 8 October 2026
- Submission deadline
- 10 November 2026, 00:00
- Estimated value
- 1 kr
- Place of performance
- SE121
- Procedure
- Open procedure
- Lots
- 1
- Documents
- 1
- Notice number
- 00693624-2026
- Reference
- af31bec1-a9e7-474a-ac38-3652b7cf2461
- Official source
- Official source
CPV codes
- 42000000Industrial machinery
Description
Myfab Uppsala aims at purchasing a Deep Reaction Ion Etcher (DRIE). The purpose of the tool is to transfer patterns defined by e.g., photo- and electron beam lithography covering the pattens size range from all substrate range down to a few nanometres. The system will be used by many operators in a university laboratory environment. It must be easy to use and be insensitive to frequent change of process between batches. The processes include broad range of etching capability: low to high etch rate, wafer dicing, high uniformity, high open area, high aspect ratio, and nanometre scale. The system is intended for etching of silicon as well as other materials compatible with silicon etching, with both photoresist resins and hard masks for patterning.
Official publications
- TED · 00693624-2026 · 8 October 2026
- OJS · 195/2026 · 8 October 2026
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Frequently asked questions
- What is the deadline to bid for this tender?
- The submission deadline is 10 November 2026, 00:00. Check the official source, as dates can be modified.
- What is the estimated value of this tender?
- The estimated value published by the buyer is 1 kr.
- Who is the buyer of this tender?
- The contracting authority is Uppsala universitet (European Union).
- How can I bid for public tenders in the European Union?
- Bids are submitted through the official public procurement portal in the European Union. El Vínculo helps you find tenders and analyse their documents; submission always happens at the official source.
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