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Atomic Layer Etching for 2DM studies

Reference ocds-b5fd17-e48529c2-2e54-450d-ae7c-2fa4b7403479 · The University of Manchester

Closed. Submission deadline: 7 May 2024.

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Description

Background information on Project This tender is being run on behalf of Prof. Roman Gorbachev for the School of Physics and Astronomy/National Graphene Institute. Project Overview The National Graphene Institute (NGI) has a large cleanroom facility housing a range of state-of-the-art instruments dedicated to the fabrication and characterization of 2D related metamaterials and devices for a broad range of applications, from advanced optoelectronics to nanofluidics. An essential part of many fabrication processes is the capability to dry etch materials. A range of plasma-based dry etching techniques have been developed for 2D materials (2DM), primarily to completely remove specific regions in order to create a pattern defined by a lithographic mask. "Thinning down" of atomically thin 2DM by etching so far remains problematic, as the surface amorphization leads to complete loss of their unique properties. Subsequently, "soft-plasma" etching techniques were developed to approach layer-by-layer etching of various 2DM. These methods provide great control of the thickness, but they are not self-limiting in nature due to associated physical etching processes an…

Official publications

MediumReferenceDate
FTS 1bc7e561-86b5-46f8-a3e6-782bdd0b70e1-737677 4 April 2024
Contracts Finder 1bc7e561-86b5-46f8-a3e6-782bdd0b70e1-737677 4 April 2024

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Frequently asked questions

What is the deadline to bid for this tender?
The submission deadline is 7 May 2024, 12:00. Check the official source, as dates can be modified.
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The contracting authority is The University of Manchester (United Kingdom).
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Data collected from official public procurement sources. Amounts as published by the buyer.