Elektronenstrahl-Lithographiesystem
Buyer: Walther-Meissner-Institut der Bayerischen Akademie der Wissenschaften
- Published
- 1 December 2023
- Submission deadline
- 10 January 2024, 12:00
- Place of performance
- Garching, DE21H
- Procedure
- Open procedure
- Lots
- 1
- Documents
- 1
- Notice number
- 00731960-2023
- Reference
- 503c00b7-8757-4dc9-b4e1-d88d0c11cd73
- Official source
- Official source
CPV codes
- 38000000Equipo de laboratorio, óptico y de precisión (excepto gafas)
- 38341100Registradores de haces electrónicos
Description
Elektronenstrahl-Lithographieanlage für die Herstellung von Mikro- und Nanostrukturen für die Forschung und Prototypenentwicklung mit hoher Auflösung. Anwendungsfelder reichen von der Herstellung von photonischen Schaltkreisen bis hin zu supraleitenden Quantenschaltkreisen mit Strukturgrößen unter 100nm und einer erforderlichen Genauigkeit im nm-Bereich.
Official publications
- TED · 00731960-2023 · 1 December 2023
- OJS · 232/2023 · 1 December 2023
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Frequently asked questions
- What is the deadline to bid for this tender?
- The submission deadline is 10 January 2024, 12:00. Check the official source, as dates can be modified.
- Who is the buyer of this tender?
- The contracting authority is Walther-Meissner-Institut der Bayerischen Akademie der Wissenschaften (European Union).
- How can I bid for public tenders in European Union?
- Bids are submitted through the official procurement portal of European Union. El Vínculo helps you find tenders and analyse their documents; submission always happens at the official source.
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