Plasmapro 100 Cobra
Buyer: Københavns Universitet
- Published
- 18 December 2024
- Place of performance
- DK011
- Procedure
- Negotiated procedure
- Lots
- 1
- Notice number
- 00773729-2024
- Reference
- 36eb4cc1-e7cb-42b3-857b-764f0bf0f6e8
- Official source
- Official source
CPV codes
- 38000000Equipo de laboratorio, óptico y de precisión (excepto gafas)
Description
We are purchasing an ICP dry etching machine for the KU cleanroom, to be installed with fluorine-based chemistry within the cleanroom. It will be optimized for the etching silicon nitride structures on both silicon and GaAs substrates during installation. • Compatibility with current cleanroom equipment - Oxford Instruments Plasmalab 100 ICP65 • Be able to process 100mm wafers, as well as individual pieces to specification. • Must realize smooth sidewall structures in Silicon Nitride that are defined by Electron Beam Lithography (EBL). • Optimization for silicon nitride etching, though capable of etching other materials (such as NbTiN.
Award criteria
- Quality — The machine is meant to be used in tandem with a chlorine-etching machine already installed at hcø. That machine is an Oxford Instruments Plasmalab 100 ICP65. For software, hardware, and maintenance…
Awards
| Awarded to | Amount | Date |
|---|---|---|
| Oxford Instruments GmbH | — | — |
Official publications
- TED · 00773729-2024 · 18 December 2024
- OJS · 246/2024 · 18 December 2024
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- The contracting authority is Københavns Universitet (European Union).
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