Metal Organic Chemical Vapor Deposition (MOCVD)
Buyer: Technische Universiteit Delft
- Published
- 22 June 2026
- Place of performance
- Delft, NL362
- Procedure
- neg-wo-call
- Lots
- 1
- Notice number
- 00426280-2026
- Reference
- 2b0967fe-cf52-49da-9be7-fbaa986142ec
- Official source
- Official source
CPV codes
- 38970000Investigación, ensayos y simuladores científico-técnicos
- 31720000Equipo electromecánico
- 38900000Instrumentos de evaluación o ensayo diversos
- 51430000Servicios de instalación de equipo técnico de laboratorio
Description
The contract concerns the supply, installation, testing (FAT/SAT), and commissioning of a Metal Organic Chemical Vapor Deposition (MOCVD) system for research purposes within the SAP-NL (National Scalable Atomic Processing Line) infrastructure. The system will be used for the controlled deposition of (Al)GaN and multiple 2D materials at atomic scale, supporting research into energy-efficient semiconductors, quantum technologies, and advanced communication systems. The system must be integrated into a contamination-controlled cleanroom environment and meet a comprehensive set of technical and functional requirements which can be found in uploaded document.
Awards
| Awarded to | Amount | Date |
|---|---|---|
| Aixtron SE | — | — |
Frequently asked questions
- Who is the buyer of this tender?
- The contracting authority is Technische Universiteit Delft (European Union).
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