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Closed European Union Supplies

ICP3 Ion etching system FIRST ETH Zurich

Buyer: ETH Zürich - Abt. Procurement & Export Services

Published
8 October 2024
Submission deadline
14 November 2024, 12:00
Procedure
Open procedure
Lots
1
Documents
1
Notice number
00603732-2024
Reference
bc0a3ccd-35a0-4853-9a03-2e217eab5db7
Official source
Official source

CPV codes

Description

Delivery of a reactive ion etching system with inductively coupled plasma, consisting of a gas supply system for at least 9 gases, with process pressure up to 100 mtorr and gas flows up to 500 sccm, RF/ICP generators in the kW range with autotuning, spectroscopic monitoring of the plasma, automatic loading lock for fast loading, for sample sizes from 4 inch diameter, with sample temperature control in the range from 10 to 300 °C.

Award criteria

Official publications

Other tenders from ETH Zürich - Abt. Procurement & Export Services

Frequently asked questions

What is the deadline to bid for this tender?
The submission deadline is 14 November 2024, 12:00. Check the official source, as dates can be modified.
Who is the buyer of this tender?
The contracting authority is ETH Zürich - Abt. Procurement & Export Services (European Union).
How can I bid for public tenders in European Union?
Bids are submitted through the official procurement portal of European Union. El Vínculo helps you find tenders and analyse their documents; submission always happens at the official source.
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Data collected from official public procurement sources. Amounts as published by the buyer.