ICP3 Ion etching system FIRST ETH Zurich
Buyer: ETH Zürich - Abt. Procurement & Export Services
- Published
- 8 October 2024
- Submission deadline
- 14 November 2024, 12:00
- Procedure
- Open procedure
- Lots
- 1
- Documents
- 1
- Notice number
- 00603732-2024
- Reference
- bc0a3ccd-35a0-4853-9a03-2e217eab5db7
- Official source
- Official source
CPV codes
- 38000000Equipo de laboratorio, óptico y de precisión (excepto gafas)
Description
Delivery of a reactive ion etching system with inductively coupled plasma, consisting of a gas supply system for at least 9 gases, with process pressure up to 100 mtorr and gas flows up to 500 sccm, RF/ICP generators in the kW range with autotuning, spectroscopic monitoring of the plasma, automatic loading lock for fast loading, for sample sizes from 4 inch diameter, with sample temperature control in the range from 10 to 300 °C.
Award criteria
- Quality — Zuschlagskriterien
Official publications
- TED · 00603732-2024 · 8 October 2024
- OJS · 196/2024 · 8 October 2024
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Frequently asked questions
- What is the deadline to bid for this tender?
- The submission deadline is 14 November 2024, 12:00. Check the official source, as dates can be modified.
- Who is the buyer of this tender?
- The contracting authority is ETH Zürich - Abt. Procurement & Export Services (European Union).
- How can I bid for public tenders in European Union?
- Bids are submitted through the official procurement portal of European Union. El Vínculo helps you find tenders and analyse their documents; submission always happens at the official source.
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