FEOL ETCH CLUSTER
Buyer: Imec EU Pilot line NV
- Published
- 2 October 2025
- Place of performance
- BE242
- Procedure
- Negotiated procedure
- Lots
- 1
- Documents
- 1
- Notice number
- 00644871-2025
- Reference
- efb8d926-3e2b-415a-99f8-7d4192e8f0a5
- Official source
- Official source
CPV codes
- 38000000Equipo de laboratorio, óptico y de precisión (excepto gafas)
Description
300mm Dry Etch Platform bestaande uit een Process Module zoals hieronder omschreven: i. Conductor Dry Ether met ICP (Inductively Coupled Plasma) RF Source Power en Dual Bottom Bias capability (RF Bias + DC Pulse Bias aan 400kHz) ii. Deze Process Module moet het vermogen hebben om RF Bias en DC Bias te superponeren. Deze Process Module is bedoeld voor verschillende FEOL-toepassingen voor N2 technologie node en verder, in het bijzonder CFET (Complementary Field Effect Transistor) toepassingen inclusief maar niet beperkt tot CFET Nanosheet Etch, CFET Full Gate Etch en CFET Source/Drain Recess. Er moeten minimaal 6 procesmoduleslots beschikbaar zijn op het platform voor een mogelijke capaciteits- en functionaliteitsupgrade. Het platform moet minimaal 5 laadpoorten bevatten.
Official publications
- TED · 00644871-2025 · 2 October 2025
- OJS · 189/2025 · 2 October 2025
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- Who is the buyer of this tender?
- The contracting authority is Imec EU Pilot line NV (European Union).
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