European Tender Two Parallel Plate Plasma-enhanced Chemical Vapor Deposition (PECVD) Systems
Buyer: Universiteit Twente
- Published
- 9 February 2026
- Estimated value
- €800,000
- Procedure
- open
- Lots
- 1
- Notice number
- 00092351-2026
- Reference
- f7dc0cc9-05fc-482f-812d-aeac3a214c4f
- Official source
- Official source
CPV codes
- 38000000Equipo de laboratorio, óptico y de precisión (excepto gafas)
Description
The University of Twente is tendering to purchase two new Plasma-Enhanced Chemical Vapor Deposition systems. The MESA+ Institute will invest in two new systems for deposition of (doped) dielectric thin films to upgrade and reinforce their state-of-the-art thin film technology and processing capacity. The systems will be used for moderate-temperature deposition of low stress thin films. For the following materials: silicon dioxide (SiO2) boron-doped SiO2 (BSG) phosphorus-doped SiO2 (PSG) boron-phosphorus-doped SiO2 (BPSG) low-stress silicon nitride (SiNx) silicon oxynitride (SiOxNy) amorphous silicon (aSi)
Awards
| Awarded to | Amount | Date |
|---|---|---|
| Oxford Instruments GmbH | €870,000 | — |
Frequently asked questions
- What is the estimated value of this tender?
- The estimated value published by the buyer is €800,000.
- Who is the buyer of this tender?
- The contracting authority is Universiteit Twente (European Union).
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