European Tender Electron Beam Lithography system
Buyer: Universiteit Twente
- Published
- 15 June 2026
- Submission deadline
- 14 August 2026
- Estimated value
- €3,500,000
- Procedure
- open
- Lots
- 1
- Notice number
- 00409508-2026
- Reference
- d75e7f85-f950-4008-ab95-b4ee18bf06fa
- Official source
- Official source
CPV codes
- 38000000Equipo de laboratorio, óptico y de precisión (excepto gafas)
- 38341100Registradores de haces electrónicos
Description
The University of Twente is tendering to purchase an Electron Beam Lithography system. The MESA+ Institute of the University of Twente will invest in a new Electron Beam system (e-beam system). A system, suitable for defining patterns in electron sensitive resists, at high resolution and high speed, compatible with a wide range of applications and substrate types up to 200mm in diameter. The system will be used by a wide range of users, i.e. academic researchers and students as well as industrial engineers with different backgrounds (photonics, (nano)-electronics etc.) and different levels of expertise.
Frequently asked questions
- What is the deadline to bid for this tender?
- The submission deadline is 14 August 2026. Check the official source, as dates can be modified.
- What is the estimated value of this tender?
- The estimated value published by the buyer is €3,500,000.
- Who is the buyer of this tender?
- The contracting authority is Universiteit Twente (European Union).
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